Ventra - Cutting edge carbon graphite products and solutions
Coated Graphite
A dense, CVD-applied silicon-carbide layer (typ. 50–100 µm) seals the graphite surface, raising oxidation threshold to ~1,350 °C and eliminating particle generation in high-vacuum reactors.
Features
Hermetic seal – stops out-gassing and prevents process contamination
Hard surface (HV 2,500) – resists mechanical abrasion during wafer loading
Chemically inert – survives HCl, NH₃ and metal-organic precursors used in MOCVD
Optical smoothness (<0.2 µm Ra) – improves thermal coupling to wafer
Industrial Applications
Semiconductor
Susceptors and wafer carriers for MOCVD of GaN, SiC epi layers
LED
Pocket susceptors for blue-LED multi-wafer reactors
Energy/Solar
Silicon-ingot casting crucible liners to reduce Fe contamination
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